• 99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing
  • 99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing
  • 99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing
  • 99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing
  • 99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing
  • 99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing

99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing

Type: Disc Grinder
Power Source: Chemical Mechanical Polishing
Object: Wafer
Application: Semiconductor
Disc(Wheel) Type: Polishing Plate
Material: Alumina Ceramics
Samples:
US$ 0/Piece 1 Piece(Min.Order)
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Customization:
Diamond Member Since 2006

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Basic Info.

Model NO.
Alumina Ceramic Wafer Polishing Plate
Working Style
Chemical Mechanical Polishing
Disc Diameter
Within 850mm
Transport Package
Carton and Wooden Box
Specification
size below ∅ 850mm, thickness 45mm.
Trademark
Chemshun Ceramics
Origin
China
HS Code
6909191200
Production Capacity
500pic /Month

Product Description

99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing (CMP)

99.7% Alumina Wafer Polishing Plate / Turn Table


99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing

>>> Application:

Chemshun Ceramics 99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing. As an important component of CMP chemical mechanical polishing process. CMP is the necessary for producing process of the sapphire and Wafer of the semiconductors. 

Chemshun Ceramics' high purity 99.7 % alumina ceramics sapphire polishing and  lapping plates, Disc are shaped as PIBM producing process. Its an internaltional  advanced technology.  PIBM sucessful solve the key problem of crack and deformation of large size alumina ceramics.PIBM technology will open another window of fine ceramics.

>>> The Process Photo of CMP:


99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing


>>> Features of Chemshun Ceramics 997 Alumina Ceramic Polishing Plate :  

High Purity Alumina
High rigidity (Hardness, Mechanical Strength, Flexural Strength, Wear Resistance)
High chemical durability
Surface shape & roughness control
For Wide Variation of wafer size & Thickness 
Ability to Resist the Severe Microchip-processing equipment environment
High Quality & Pretty Price Compare to Japane Alumina Polishing Plate


>>> Size:

Disc, ring size below ∅850mm, thickness 45mm.
For example: D150mm, D360mm,D 600mm.
Customized products with various size are accepted.


>>> Main Parameter : 
 
    Unit Chemshun 99.7 Alumina Ceramics
General Properties Al2O3 content wt% 99.7-99.9
Density gm/cc 3.94-3.97
Color - Ivory
Water absorption % 0
Mechanical Properties Flexural Strength(MOR) 20 ºC Mpa(psix10^3) 440-550
Elastic Modulus 20ºC GPa (psix10^6) 375
Vickers Hardness Gpa(kg/mm2) R45N >=17
Bending Strength Gpa 390
Tensile Strength 25ºC MPa(psix10^3) 248
Fracture Toughness (K I c) Mpa* m^1/2 4-5
Thermal Properities Thermal conductivity(20ºC) W/mk 30
Coefficient of Thermal expansion(25-1000ºC) 1x 10^-6/ºC 7.6
Thermal Shock Resistance ºC 200
Maximum use temperature ºC 1700
Electrical Properities Dielectric Strength (1MHz) ac-kv/mm(ac v/mil) 8.7
Dielectric Constant(1 MHz) 25ºC 9.7
Volume Resistivity ohm-cm (25ºC) >10^14
ohm-cm (500ºC) 2x10^12
ohm-cm (1000ºC) 2x10^7


  

99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing


99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing
99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing
99.7% Alumina Wafer Polishing Plate for Chemical Mechanical Polishing
 

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