Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)

Product Details
Customization: Available
Al2O3: 99.7~99.9%
Application: Semiconductors
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  • Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)
  • Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)
  • Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)
  • Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)
  • Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)
  • Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)
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Basic Info.

Model NO.
Chemshun Ceramic
Specification
Within D850mm, thickness 45mm.
Trademark
Chemshun Ceramics
Origin
China
HS Code
6909191200
Production Capacity
500pic /Month

Product Description

Alumina ceramic wafer polishing plates are used in Chemical Mechanical Polishing (CMP)

Description: 

Chemshun Ceramics' alumina ceramics sapphire lapping wafer polishing is shaped as PIBM producing process. Its an internaltional  advanced technology.  PIBM sucessful solve the key problem of crack and deformation of large size alumina ceramics.PIBM technology will open another window of fine ceramics. We not only produce the high quality alumina ceramic wafer polishing plate, but also other series of large size high purity alumina ceramics such as 1200x500x20mm ceramic substrates for LCD manufacturing equipment, semiconductor delviery tracks, vacuum parts, general mechanical parts, bulletproof ceramics. 

Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)

Application:

Pingxiang Chemshun Ceramics' High Purity 99.7% Alumina Ceramic Sapphire Lapping wafer Polishing Turn Table as an important component of CMP chemical mechanical polishing process. CMP is the necessary for producing process of the sapphire and Wafer. Because of the high purity alumina ceramics polishing plate excellent working performance, it is replacing the Metal wafer polishing plate. 




Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)


Features :  

High rigidity (Hardness, Mechanical Strength, Wear Resistance)
High chemical durability
Surface shape & roughness control
Pretty Price


Size:

Disc, ring size below ∅850mm, thickness 45mm.
For example: D150mm, D360mm, D450MM D600mm.
Customized products with various size are accepted.


Main Parameter : (Chemical / physical):
 
    Unit Chemshun 99.7 Alumina Ceramics
General Properties Al2O3 content wt% 99.7-99.9
Density gm/cc 3.94-3.97
Color - Ivory
Water absorption % 0
Mechanical Properties Flexural Strength(MOR) 20 ºC Mpa(psix10^3) 440-550
Elastic Modulus 20ºC GPa (psix10^6) 375
Vickers Hardness Gpa(kg/mm2) R45N >=17
Bending Strength Gpa 390
Tensile Strength 25ºC MPa(psix10^3) 248
Fracture Toughness (K I c) Mpa* m^1/2 4-5
Thermal Properities Thermal conductivity(20ºC) W/mk 30
Coefficient of Thermal expansion(25-1000ºC) 1x 10^-6/ºC 7.6
Thermal Shock Resistance ºC 200
Maximum use temperature ºC 1700
Electrical Properities Dielectric Strength (1MHz) ac-kv/mm(ac v/mil) 8.7
Dielectric Constant(1 MHz) 25ºC 9.7
Volume Resistivity ohm-cm (25ºC) >10^14
ohm-cm (500ºC) 2x10^12
ohm-cm (1000ºC) 2x10^7

Chemshun Ceramics High Purity 99.7% Alumina Ceramic Sapphire Polishing Turn Table widely used in the semiconductors manufacturing equipment. For more information, welcome to direclty contact with us.

Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)


Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)

Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)


Alumina Ceramic Wafer Polishing Plates Are Used in Chemical Mechanical Polishing (CMP)
 

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